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2025 TechCon: Geometry Dependent Thin Film Uniformity in Large Area Sputtering with Rotary Cathodes

by Patrick Morse about a day ago
Nov24
2025 TechCon: Geometry Dependent Thin Film Uniformity in Large Area Sputtering with Rotary Cathodes

SVC has published my 2025 presentation.

Optimization Though Simulation

Simulation of plasma based processes builds a deeper understanding of the fundamental influences of magnetic fields, electric fields, molecular density, partial pressure, sputter yields, and secondalry electron yields in a sputteirng process. Validation for such simulations comes from characterizing the deposited fims and the target utilization.

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