Arizona Thin Film Research would like to help improve your sputtering process if you answered yes to any of these questions.
Overlapping Goals
Dec03
Optimization Though Simulation
Simulation of plasma based processes builds a deeper understanding of the fundamental influences of magnetic fields, electric fields, molecular density, partial pressure, sputter yields, and secondalry electron yields in a sputteirng process. Validation for such simulations comes from characterizing the deposited fims and the target utilization.
